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SOURCE: insertion device - an Elliptically Polarized Undulator (EPU) capable of fully rotatable linear as well as elliptically polarized light.
OPTICS: A plane or spherical grating with input and refocussing mirrors. The STXM focuses the soft X-ray light with a Fresnel zone plate.
| PHOTON RANGE: | 6 to 60 (100) Å or |
| 250 (100) to 1900 eV |
| PHOTON FLUX: | Pre-Zone Plate: 1014 in 50 micron. |
| Post-Zone Plate: 108 in 50 nm. |
RESOLUTION: E/DE = 8000.
CAPABILITIES
(i) Scanning Transmission X-ray Microscope (STXM): Imaging, XAFS, Microspectroscopy (NEXAFS), operate in non-UHV environment, including liquids and ambient air.
(ii) Photoelectron Emission Microscopy (PEEM): Imaging, Microscopy, EXAFS, NEXAFS, operates in UHV only.
(iii) An absorption/ionization gas cell, for order filtering and for beam diagnostics.