WHO: Adam Hitchcock, Jian Wang, Harald Stover, Chemistry & BIMR, McMaster University
Tolek Tyliszczak, Berkeley Lab
WHAT: The large differences in X-ray absorption among different polymers provides a mechanism to use the bright, monochromated, focused STXM beam for chemically selective soft X-ray lithography. Although secondary mechanisms (electrons and radicals) conspire to destroy the chemical selectivity by transferring energy among chemical species, this can be circumvented by use of appropriate radical barriers. In conjunction with pattern generation programs, we are writing multi-color patterns into polymer thin film structures:
* to demonstrate this novel type of lithography,
The image shows a 2-color pattern written into a PAN, PMMA bi-layer at the peaks of their C 1s absorption energies (see C 1s spectra). The selectivity is demonstrated by the C 1s image sequence (movie). The color composite was generated by assigning red to the signal from PMMA-damage and blue to the signal from PAN-damage, determined by spectral analysis of the image sequence.
Three color patterns have been achieved using a tri-layer structure.
© 2005 A.P. Hitchcock / McMaster University
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